Chemical Reaction Engineering of Plasma CVD

Low-pressure CVD and Plasma- Enhanced CVD

LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...

In the Introductory Chemical Reaction Engineering Course

In practice, the issue of mixing and chemical reactions is very important in the economic aspects of chemical reaction engineering. A major priority in industrial reactors is to optimize the yield of desired products. This optimization is a function of reactor geometry, the chemical and physical characteristics of the reacting system, the degree of mixing, and the mode of supplying the reactor ...

Simulation of a Multi-Component Transport Model for the Chemical Reaction of a CVD-Process

In this paper we present discretization and decomposition methods for a multi-component transport model of a chemical vapor deposition (CVD) process. CVD processes are used to manufacture deposition layers or bulk materials. In our transport model we simulate the deposition of thin layers. The microscopic model is based on the heavy particles, which are derived by approximately solving a linear...

Role of Chemical Reaction Engineering in Sustainable Process Development

Low Temperature Plasma CVD Grown Graphene by Microwave Surface-Wave Plasma CVD Using Camphor Precursor

Hydrocarbon precursor such as methane has been widely used to grow graphene films and the methods of growing quality graphene films are dominated by thermal CVD (chemical vapor deposition) system. Graphene films grown by plasma process are generally highly defective which in turns degrade the quality of the films. Here, using a green precursor, camphor we demonstrate a simple and economical met...